Temperature dependence of luminescence for different surface flaws in high purity silica glass

Jessica Fournier (1, 2, 3) , Pierre Grua (1) , Jérôme Néauport (1) , Evelyne Fargin (2, 3) , Veronique Jubera (2, 3) , David Talaga (3) , André del Guerzo (3) , Guillaume Raffy (3) , Stéphane Jouannigot (4)

1 CESTA - Centre d'études scientifiques et techniques d'Aquitaine
2 ICMCB - Institut de Chimie de la Matière Condensée de Bordeaux
3 ISM - Institut des Sciences Moléculaires
4 LCTS - Laboratoire des Composites Thermostructuraux

In situ temperature dependence of the Photoluminescence under 325nm irradiation is used to investigate defect populations existing in different surface flaws in high purity fused silica. Five photoluminescence bands peaking at 1.9, 2.1, 2.3, 2.63 and 3.11 eV have been detected in the spectral area ranging from 1.6 up to 3.6 eV. The Gaussian deconvolution of spectra allows dividing the five luminescence bands in two categories. The former corresponds to bands showing a significant intensity enhancement while temperature decreases; the latter corresponds to bands remaining insensitive to the temperature evolution. Such a behavior brings new information on defects involved in laser damage mechanism at 351 nm in nanosecond regime.

Mots clés: Fluorescence microscopy; Laser damage; Glass; Optics

Domaines: Matériaux

Jessica Fournier, Pierre Grua, Jérôme Néauport, Evelyne Fargin, Veronique Jubera, et al.. Temperature dependence of luminescence for different surface flaws in high purity silica glass. Optical Materials Express, 2013, 3 (1), pp.1-10. ⟨10.1364/OME.3.000001⟩. ⟨hal-00806313⟩